Characterization of Thin Films by Glancing Incidence X-ray Diffraction

Two dimensional materials created ab-initio by the process of condensation of atoms, molecules or ions, called thin films, have unique properties significantly different from the corresponding bulk materials as a result of their physical dimensions, geometry, non-equilibrium microstructure and metallurgy. These characteristic features of thin films can be drastically modified and tailored to obtain the desired properties. This forms the basis of development of a host of active and passive thin films devices [1], in such areas as very large scale integrated (VLSI) circuits, quantum engineering, integrated optics, photovoltaic conversion and special coatings for surface engineering.